UV™6 Positive DUV Resist

Dow Electronic Materials
UV™-6 Positive DUV Resist

Optimized to provide vertical profile imaging of dense and semi-isolated features for device production design rules to 180 nm

  • Superior etch resistance
  • Wide process window
  • 150° thermal stability

UV™-6 Data Sheet



  • General Lithography: Positive DUV Resists

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