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UV™ 26 Positive DUV Resist

Dow Electronic Materials
UV™ 26 Positive DUV Resist

Positive DUV photoresist developed for deep implant applications

  • Low viscosity allows for reduced dispense volume
  • Improved coating uniformity for films ranging from 1.1 µm to 3.0 µm
  • 150°C thermal stability

UV™ 26 Data Sheet

Ancillaries:

Applications:

  • General Lithography: Positive DUV Resists

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