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MEGAPOSIT™ SPR™660 Series Advanced i-Line Photoresists

Dow Electronic Materials
 MEGAPOSIT™ SPR™660 Series Advanced i-line Photoresists

Designed for processing 0.350 micron features and larger

  • Performs in both line/space and contact hold applications
  • Performs on a variety of substrates including silicon, silicon dioxide, titanium nitride, and organic anti-reflectant coatings
  • Family includes range of undyed dilutions and two dye loadings
  • High throughput

SPR™660 Data Sheet

Ancillaries:

Applications:

  • High Resolution i-Line
  • Bi-layer Lift-off

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