MEGAPOSIT™ SPR™660 Series Advanced i-Line Photoresists
Designed for processing 0.350 micron features and larger
- Performs in both line/space and contact hold applications
- Performs on a variety of substrates including silicon, silicon dioxide, titanium nitride, and organic anti-reflectant coatings
- Family includes range of undyed dilutions and two dye loadings
- High throughput
SPR™660 Data Sheet
- High Resolution i-Line
- Bi-layer Lift-off
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